Photoresist Stripper, RBP Chemical Technology
SKU: ADF-25C
or call us at 1-800-727-0467
A highly concentrated product formulated to remove today’s newest dry film resists in soak or spray applications, at 5% concentration. ADF-25C breaks dry films into particles suitable for filtration. It also protects panels from staining caused by dyes in the photoresists. ADF-25C demonstrates consistently high loading capabilities and contains an enhanced copper brightening and antitarnish package. This enables it to produce bright, uniform copper surface for automatic optical inspection and better etching capabilities.
| Manufacturer | N/A |
|---|---|
| Promo Text | N/A |
